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1 Ergebnisse
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F2 Laser Resist with Fluorinated Polymers:
Naito, Takuya
;
Saito, Satoshi
;
Shida, Naomi
.
Journal of Photopolymer Science and Technology. 15 (2002) 4 - p. 689-692 , 2002
Link:
https://doi.org/10.2494/photopolymer.15.689
RT Journal T1 <Title>F2 Laser Resist with Fluorinated Polymers</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.15.689&Exemplar=1&LAN=DE A1 Naito, Takuya A1 Saito, Satoshi A1 Shida, Naomi A1 Ushirogouchi, Tohru PB Technical Association of Photopolymers, Japan YR 2002 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 15 IS 4 SP 689 OP 692 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.15.689 DO https://doi.org/10.2494/photopolymer.15.689 SF ELIB - SuUB Bremen
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