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1 Ergebnisse
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Development of High-Performance Negative-tone Resists for 1..:
Hattori, Takashi
;
Yokoyama, Yoshiyuki
;
Kimura, Kaori
...
Journal of Photopolymer Science and Technology. 16 (2003) 4 - p. 489-498 , 2003
Link:
https://doi.org/10.2494/photopolymer.16.489
RT Journal T1 <Title>Development of High-Performance Negative-tone Resists for 193-nm Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.16.489&Exemplar=1&LAN=DE A1 Hattori, Takashi A1 Yokoyama, Yoshiyuki A1 Kimura, Kaori A1 Yamanaka, Ryoko A1 Tanaka, Toshihiko A1 Fukuda, Hiroshi PB Technical Association of Photopolymers, Japan YR 2003 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 16 IS 4 SP 489 OP 498 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.16.489 DO https://doi.org/10.2494/photopolymer.16.489 SF ELIB - SuUB Bremen
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