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Contact Hole Resist Solutions for 45-90nm Node Design Rules:
Padmanaban, Murirathna
;
Kudo, Takamori
;
Lin, Guanyang
...
Journal of Photopolymer Science and Technology. 17 (2004) 4 - p. 489-496 , 2004
Link:
https://doi.org/10.2494/photopolymer.17.489
RT Journal T1 <Title>Contact Hole Resist Solutions for 45-90nm Node Design Rules</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.17.489&Exemplar=1&LAN=DE A1 Padmanaban, Murirathna A1 Kudo, Takamori A1 Lin, Guanyang A1 Hong, Sungeun A1 Nishibe, Takeshi A1 Takano, Yusuke PB Technical Association of Photopolymers, Japan YR 2004 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 17 IS 4 SP 489 OP 496 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.17.489 DO https://doi.org/10.2494/photopolymer.17.489 SF ELIB - SuUB Bremen
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