I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
193 nm Immersion Lithography-Taking the Plunge:
Dammel, Ralph
;
Houlihan, Frank M.
;
Sakamuri, Raj
..
Journal of Photopolymer Science and Technology. 17 (2004) 4 - p. 587-601 , 2004
Link:
https://doi.org/10.2494/photopolymer.17.587
RT Journal T1 <Title>193 nm Immersion Lithography-Taking the Plunge</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.17.587&Exemplar=1&LAN=DE A1 Dammel, Ralph A1 Houlihan, Frank M. A1 Sakamuri, Raj A1 Rentkiewicz, David A1 Romano, Andrew PB Technical Association of Photopolymers, Japan YR 2004 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 17 IS 4 SP 587 OP 601 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.17.587 DO https://doi.org/10.2494/photopolymer.17.587 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
