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1 Ergebnisse
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Fluoropolymer Resists: Fundamentals and Lithographic Evalua..:
Ito, H.
;
Truong, H. D.
;
Rhodes, L. F.
...
Journal of Photopolymer Science and Technology. 17 (2004) 4 - p. 609-619 , 2004
Link:
https://doi.org/10.2494/photopolymer.17.609
RT Journal T1 <Title>Fluoropolymer Resists: Fundamentals and Lithographic Evaluation</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.17.609&Exemplar=1&LAN=DE A1 Ito, H. A1 Truong, H. D. A1 Rhodes, L. F. A1 Chang, C. A1 Langsdorf, L. J. A1 Sidaway, H. A. A1 Maeda, K. A1 Sumida, S. PB Technical Association of Photopolymers, Japan YR 2004 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 17 IS 4 SP 609 OP 619 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.17.609 DO https://doi.org/10.2494/photopolymer.17.609 SF ELIB - SuUB Bremen
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