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Changing Behavior of Residue during Dry Etching in Multilay..:

Keiji, Watanabe ; Shoichi, Suda ; Masayuki, Takeda.
Journal of Photopolymer Science and Technology.  18 (2005)  1 - p. 157-163 , 2005
Link: https://doi.org/10.2494/photopolymer.18.157