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Characterization and Lithographic Performance of Silsesquio..:
Ito, Hiroshi
;
Truong, Hoa D
;
Burns, Sean D.
...
Journal of Photopolymer Science and Technology. 18 (2005) 3 - p. 355-364 , 2005
Link:
https://doi.org/10.2494/photopolymer.18.355
RT Journal T1 <Title>Characterization and Lithographic Performance of Silsesquioxane 193 nm Bilayer Resists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.18.355&Exemplar=1&LAN=DE A1 Ito, Hiroshi A1 Truong, Hoa D A1 Burns, Sean D. A1 Pfeiffer, Dirk A1 Huang, Wu-Song A1 Khojastech, Mahmoud M. A1 Varanasi, P. Rao A1 Lercel, Mike PB Technical Association of Photopolymers, Japan YR 2005 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 18 IS 3 SP 355 OP 364 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.18.355 DO https://doi.org/10.2494/photopolymer.18.355 SF ELIB - SuUB Bremen
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