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Fluoropolymer Outgassing in Focused Ion Beam Micromachining:
Matsui, Yoshinori
;
Seki, Shu
;
Tagawa, Seiichi
Journal of Photopolymer Science and Technology. 18 (2005) 4 - p. 501-502 , 2005
Link:
https://doi.org/10.2494/photopolymer.18.501
RT Journal T1 <Title>Fluoropolymer Outgassing in Focused Ion Beam Micromachining</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.18.501&Exemplar=1&LAN=DE A1 Matsui, Yoshinori A1 Seki, Shu A1 Tagawa, Seiichi PB Technical Association of Photopolymers, Japan YR 2005 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 18 IS 4 SP 501 OP 502 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.18.501 DO https://doi.org/10.2494/photopolymer.18.501 SF ELIB - SuUB Bremen
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