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Leaching Phenomena and their Suppresion in 193 nm Immersion..:
Dammel, Ralph R.
;
Pawlowski, Georg
;
Romano, Andrew
...
Journal of Photopolymer Science and Technology. 18 (2005) 5 - p. 593-602 , 2005
Link:
https://doi.org/10.2494/photopolymer.18.593
RT Journal T1 <Title>Leaching Phenomena and their Suppresion in 193 nm Immersion Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.18.593&Exemplar=1&LAN=DE A1 Dammel, Ralph R. A1 Pawlowski, Georg A1 Romano, Andrew A1 Hoolihan, Frank M. A1 Kim, Woo-Kyu A1 Sakmuri, Raj A1 Abdallah, David A1 Padmanaban, Murirathna A1 Rahman, M. Dalil A1 McKenzie, Douglas PB Technical Association of Photopolymers, Japan YR 2005 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 18 IS 5 SP 593 OP 602 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.18.593 DO https://doi.org/10.2494/photopolymer.18.593 SF ELIB - SuUB Bremen
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