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Evaluation of Resist Capability for EUV Lithography:
Oizumi, Hiroaki
;
Tanaka, Yusuke
;
Shiono, Daiji
...
Journal of Photopolymer Science and Technology. 19 (2006) 4 - p. 507-514 , 2006
Link:
https://doi.org/10.2494/photopolymer.19.507
RT Journal T1 <Title>Evaluation of Resist Capability for EUV Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.19.507&Exemplar=1&LAN=DE A1 Oizumi, Hiroaki A1 Tanaka, Yusuke A1 Shiono, Daiji A1 Hirayama, Taku A1 Hada, Hideo A1 Onodera, Junichi A1 Yamaguchi, Atsuko A1 Nishiyama, Iwao PB Technical Association of Photopolymers, Japan YR 2006 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 19 IS 4 SP 507 OP 514 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.19.507 DO https://doi.org/10.2494/photopolymer.19.507 SF ELIB - SuUB Bremen
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