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Responding to the Challenge: Materials Design for Immersion..:
Padmanaban, Munirathna
;
Romano, Andrew
;
Lin, Guanyang
...
Journal of Photopolymer Science and Technology. 19 (2006) 4 - p. 555-563 , 2006
Link:
https://doi.org/10.2494/photopolymer.19.555
RT Journal T1
Responding to the Challenge: Materials Design for Immersion Lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.19.555&Exemplar=1&LAN=DE A1 Padmanaban, Munirathna A1 Romano, Andrew A1 Lin, Guanyang A1 Chiu, Simon A1 Timko, Allen A1 Houlihan, Frank A1 Rahman, Dalil A1 Dammel, Ralph R. A1 Turnquest, Karen A1 Rich, Georgia A1 Shuetter, Scott D. A1 Shedd, Timonthy A. A1 Nellis, Gregory A. PB Technical Association of Photopolymers, Japan YR 2006 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 19 IS 4 SP 555 OP 563 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.19.555 DO https://doi.org/10.2494/photopolymer.19.555 SF ELIB - SuUB Bremen
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