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1 Ergebnisse
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High Refractive Index Fluid for Next Generation ArF Immersi..:
Furukawa, Taiichi
;
Hieda, Katsuhiko
;
Wang, Yong
...
Journal of Photopolymer Science and Technology. 19 (2006) 5 - p. 641-646 , 2006
Link:
https://doi.org/10.2494/photopolymer.19.641
RT Journal T1 <Title>High Refractive Index Fluid for Next Generation ArF Immersion Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.19.641&Exemplar=1&LAN=DE A1 Furukawa, Taiichi A1 Hieda, Katsuhiko A1 Wang, Yong A1 Miyamatsu, Takashi A1 Yamada, Kinji A1 Tominaga, Tetsuo A1 Makita, Yutaka A1 Nakagawa, Hiroki A1 Nakamura, Atshushi A1 Shima, Motoyuki A1 Shimokawa, Tsutomu PB Technical Association of Photopolymers, Japan YR 2006 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 19 IS 5 SP 641 OP 646 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.19.641 DO https://doi.org/10.2494/photopolymer.19.641 SF ELIB - SuUB Bremen
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