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Study on a positive photoresist with high dry etching resis..:
Wang, Zheng-fang
;
Du, Yu-qian
;
Xu, Jun
Journal of Photopolymer Science and Technology. 2 (1989) 1 - p. 89-93 , 1989
Link:
https://doi.org/10.2494/photopolymer.2.89
RT Journal T1 <Title>Study on a positive photoresist with high dry etching resistance</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.2.89&Exemplar=1&LAN=DE A1 Wang, Zheng-fang A1 Du, Yu-qian A1 Xu, Jun PB Technical Association of Photopolymers, Japan YR 1989 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 2 IS 1 SP 89 OP 93 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.2.89 DO https://doi.org/10.2494/photopolymer.2.89 SF ELIB - SuUB Bremen
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