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Evaluation of New Molecular Resist for EUV Lithography:
Oizumi, Hiroaki
;
Tanaka, Yuusuke
;
Kumise, Takaaki
...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 403-410 , 2007
Link:
https://doi.org/10.2494/photopolymer.20.403
RT Journal T1 <Title>Evaluation of New Molecular Resist for EUV Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.20.403&Exemplar=1&LAN=DE A1 Oizumi, Hiroaki A1 Tanaka, Yuusuke A1 Kumise, Takaaki A1 Shiono, Daiju A1 Hirayama, Taku A1 Hada, Hideo A1 Onodera, Junichi A1 Yamaguchi, Atusko A1 Nishiyama, Iwao PB Technical Association of Photopolymers, Japan YR 2007 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 20 IS 3 SP 403 OP 410 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.20.403 DO https://doi.org/10.2494/photopolymer.20.403 SF ELIB - SuUB Bremen
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