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Mitigation of Low LER with PAG Bonded Resist for EUVL:
Fukushima, Yasuyuki
;
Watanabe, Takeo
;
Ohnishi, Ryuji
...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 419-422 , 2007
Link:
https://doi.org/10.2494/photopolymer.20.419
RT Journal T1 <Title>Mitigation of Low LER with PAG Bonded Resist for EUVL</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.20.419&Exemplar=1&LAN=DE A1 Fukushima, Yasuyuki A1 Watanabe, Takeo A1 Ohnishi, Ryuji A1 Kinoshita, Hiroo A1 Shiotani, Hideaki A1 Suzuki, Shouta A1 Hayakawa, Masamichi A1 Endo, Yusuke A1 Yamanaka, Tomotaka A1 Yusaa, Shinichi PB Technical Association of Photopolymers, Japan YR 2007 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 20 IS 3 SP 419 OP 422 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.20.419 DO https://doi.org/10.2494/photopolymer.20.419 SF ELIB - SuUB Bremen
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