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Current Status of High-n Immersion Lithography Development:
Sewell, Harry
;
Mulkens, Jan
;
Wagner, Christian
...
Journal of Photopolymer Science and Technology. 20 (2007) 5 - p. 651-663 , 2007
Link:
https://doi.org/10.2494/photopolymer.20.651
RT Journal T1 <Title>Current Status of High-n Immersion Lithography Development</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.20.651&Exemplar=1&LAN=DE A1 Sewell, Harry A1 Mulkens, Jan A1 Wagner, Christian A1 McCafferty, Diane A1 Markoya, Louis A1 Lipson, Matthew A1 Samarakone, Naundasiri PB Technical Association of Photopolymers, Japan YR 2007 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 20 IS 5 SP 651 OP 663 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.20.651 DO https://doi.org/10.2494/photopolymer.20.651 SF ELIB - SuUB Bremen
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