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A Novel Mechanism to Afford Photosensitivity to Unfunctiona..:
Oyama, Toshiyuki
;
Sugawara, Shintaro
;
Shimizu, Yuji
...
Journal of Photopolymer Science and Technology. 22 (2009) 5 - p. 597-602 , 2009
Link:
https://doi.org/10.2494/photopolymer.22.597
RT Journal T1 <Title>A Novel Mechanism to Afford Photosensitivity to Unfunctionalized Polyimides: Negative-tone Reaction Development Patterning</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.22.597&Exemplar=1&LAN=DE A1 Oyama, Toshiyuki A1 Sugawara, Shintaro A1 Shimizu, Yuji A1 Cheng, Xu A1 Tomoi, Masao A1 Takahashi, Akio PB Technical Association of Photopolymers, Japan YR 2009 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 22 IS 5 SP 597 OP 602 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.22.597 DO https://doi.org/10.2494/photopolymer.22.597 SF ELIB - SuUB Bremen
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