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Study of EUV Resist Outgassing/Contamination for Device Int..:
Pollentier, Ivan
Journal of Photopolymer Science and Technology. 23 (2010) 5 - p. 605-612 , 2010
Link:
https://doi.org/10.2494/photopolymer.23.605
RT Journal T1 <Title>Study of EUV Resist Outgassing/Contamination for Device Integration using EUVL Processes</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.23.605&Exemplar=1&LAN=DE A1 Pollentier, Ivan PB Technical Association of Photopolymers, Japan YR 2010 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 23 IS 5 SP 605 OP 612 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.23.605 DO https://doi.org/10.2494/photopolymer.23.605 SF ELIB - SuUB Bremen
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