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1 Ergebnisse
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Fundamental Decomposition Analysis of Chemically Amplified ..:
Shiono, Daiju
;
Hada, Hideo
;
Sato, Kazufumi
...
Journal of Photopolymer Science and Technology. 23 (2010) 5 - p. 649-655 , 2010
Link:
https://doi.org/10.2494/photopolymer.23.649
RT Journal T1 <Title>Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22nm Resolution</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.23.649&Exemplar=1&LAN=DE A1 Shiono, Daiju A1 Hada, Hideo A1 Sato, Kazufumi A1 Fukushima, Yasuyuki A1 Watanabe, Takeo A1 Kinoshita, Hiroo PB Technical Association of Photopolymers, Japan YR 2010 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 23 IS 5 SP 649 OP 655 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.23.649 DO https://doi.org/10.2494/photopolymer.23.649 SF ELIB - SuUB Bremen
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