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Effect of Molecular Weights of 193nm Resist Polymers on the..:
Bae, Young C.
;
Lee, Seung-Hyun
;
Bell, Rosemary
...
Journal of Photopolymer Science and Technology. 24 (2011) 2 - p. 211-217 , 2011
Link:
https://doi.org/10.2494/photopolymer.24.211
RT Journal T1 <Title>Effect of Molecular Weights of 193nm Resist Polymers on the Negative Tone Development Process</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.24.211&Exemplar=1&LAN=DE A1 Bae, Young C. A1 Lee, Seung-Hyun A1 Bell, Rosemary A1 Park, Jong Keun A1 Cardolaccia, Thomas A1 LIu, Yi A1 Sun, Jibin A1 Andes, Cecily A1 Kim, Young Seok A1 Barclay, Georgee G. PB Technical Association of Photopolymers, Japan YR 2011 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 24 IS 2 SP 211 OP 217 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.24.211 DO https://doi.org/10.2494/photopolymer.24.211 SF ELIB - SuUB Bremen
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