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A Resolution Enhancement Material for 193-nm Lithography Co..:
Nozaki, Koji
;
Igarashi, Miwa
;
Yano, Ei
...
Journal of Photopolymer Science and Technology. 24 (2011) 6 - p. 657-665 , 2011
Link:
https://doi.org/10.2494/photopolymer.24.657
RT Journal T1 <Title>A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.24.657&Exemplar=1&LAN=DE A1 Nozaki, Koji A1 Igarashi, Miwa A1 Yano, Ei A1 Ishikawa, Seiichi A1 Yamamoto, Hajime A1 Asai, Satoru A1 Kanbara, Takaki PB Technical Association of Photopolymers, Japan YR 2011 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 24 IS 6 SP 657 OP 665 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.24.657 DO https://doi.org/10.2494/photopolymer.24.657 SF ELIB - SuUB Bremen
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