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1 Ergebnisse
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EUV Resist Process Performance Investigations on the NXE310..:
Goethals, Anne-Marie
;
Foubert, Philippe
;
Hosokawa, Kohei
...
Journal of Photopolymer Science and Technology. 25 (2012) 5 - p. 559-567 , 2012
Link:
https://doi.org/10.2494/photopolymer.25.559
RT Journal T1
EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner
UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.25.559&Exemplar=1&LAN=DE A1 Goethals, Anne-Marie A1 Foubert, Philippe A1 Hosokawa, Kohei A1 Roey, Frieda Van A1 Niroomand, Ardavan A1 Heuvel, Dieter Van den A1 Pollentier, Ivan PB Technical Association of Photopolymers, Japan YR 2012 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 25 IS 5 SP 559 OP 567 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.25.559 DO https://doi.org/10.2494/photopolymer.25.559 SF ELIB - SuUB Bremen
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