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Functional Properties of Novel Metallic Hard Masks:
Padmanaban, Murirathna
;
Cho, Joon Yeon
;
Yao, Huirong
...
Journal of Photopolymer Science and Technology. 26 (2013) 2 - p. 231-238 , 2013
Link:
https://doi.org/10.2494/photopolymer.26.231
RT Journal T1 <Title>Functional Properties of Novel Metallic Hard Masks</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.26.231&Exemplar=1&LAN=DE A1 Padmanaban, Murirathna A1 Cho, Joon Yeon A1 Yao, Huirong A1 McKenzie, Douglas A1 Dioses, Alberto A1 Mullen, Salem A1 Wolfer, Elizabeth A1 Kurosawa, Kazunori PB Technical Association of Photopolymers, Japan YR 2013 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 26 IS 2 SP 231 OP 238 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.26.231 DO https://doi.org/10.2494/photopolymer.26.231 SF ELIB - SuUB Bremen
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