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Directed Self Assembly Material Development for Fine Patter..:
Minegishi, Shinya
;
Namie, Yuji
;
Izumi, Kenichi
...
Journal of Photopolymer Science and Technology. 26 (2013) 1 - p. 27-30 , 2013
Link:
https://doi.org/10.2494/photopolymer.26.27
RT Journal T1 <Title>Directed Self Assembly Material Development for Fine Patterning and Pattern Repair</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.26.27&Exemplar=1&LAN=DE A1 Minegishi, Shinya A1 Namie, Yuji A1 Izumi, Kenichi A1 Anno, Yusuke A1 Buch, Xavier A1 Naruoka, Takehiko A1 Hishiro, Yoshi A1 Nagai, Tomoki PB Technical Association of Photopolymers, Japan YR 2013 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 26 IS 1 SP 27 OP 30 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.26.27 DO https://doi.org/10.2494/photopolymer.26.27 SF ELIB - SuUB Bremen
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