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The Impact and Optimization of EUV Sensitive Si Hardmask fo..:
Shigaki, Shuhei
;
Onishi, Ryuji
;
Yaguchi, Hiroaki
...
Journal of Photopolymer Science and Technology. 26 (2013) 5 - p. 679-683 , 2013
Link:
https://doi.org/10.2494/photopolymer.26.679
RT Journal T1 <Title>The Impact and Optimization of EUV Sensitive Si Hardmask for Sub-20nm Patterning in EUVL with NTD Process</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.26.679&Exemplar=1&LAN=DE A1 Shigaki, Shuhei A1 Onishi, Ryuji A1 Yaguchi, Hiroaki A1 Shibayama, Wataru A1 Fujitani, Noriaki A1 Sakamoto, Rikimaru PB Technical Association of Photopolymers, Japan YR 2013 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 26 IS 5 SP 679 OP 683 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.26.679 DO https://doi.org/10.2494/photopolymer.26.679 SF ELIB - SuUB Bremen
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