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Pulse Radiolysis Study on a Highly Sensitive Chlorinated Re..:
Hosaka, Yuji
;
Oyama, Tomoko Gowa
;
Oshima, Akihiro
...
Journal of Photopolymer Science and Technology. 26 (2013) 6 - p. 745-750 , 2013
Link:
https://doi.org/10.2494/photopolymer.26.745
RT Journal T1 <Title>Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.26.745&Exemplar=1&LAN=DE A1 Hosaka, Yuji A1 Oyama, Tomoko Gowa A1 Oshima, Akihiro A1 Enomoto, Satoshi A1 Washio, Masakazu A1 Tagawa, Seiichi PB Technical Association of Photopolymers, Japan YR 2013 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 26 IS 6 SP 745 OP 750 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.26.745 DO https://doi.org/10.2494/photopolymer.26.745 SF ELIB - SuUB Bremen
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