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1 Ergebnisse
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Novel Ion Implantation Process with High Heat Resistant Pho..:
Fujiwara, Takanori
;
Tanigaki, Yugo
;
Furukawa, Yukihiro
...
Journal of Photopolymer Science and Technology. 27 (2014) 2 - p. 233-236 , 2014
Link:
https://doi.org/10.2494/photopolymer.27.233
RT Journal T1 <Title>Novel Ion Implantation Process with High Heat Resistant Photoresist in Silicon Carbide Device Fabrication</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.27.233&Exemplar=1&LAN=DE A1 Fujiwara, Takanori A1 Tanigaki, Yugo A1 Furukawa, Yukihiro A1 Tonari, Kazuhiro A1 Otsuki, Akihiro A1 Imai, Tomohiro A1 Oose, Naoyuki A1 Utsumi, Makoto A1 Ryo, Mina A1 Gotoh, Masahide A1 Nakamata, Shinichi A1 Sakai, Takao A1 Sakai, Yoshiyuki A1 Miyajima, Masaaki A1 Kumura, Hiroshi A1 Fukuda, Kenji A1 Okumura, Hajime PB Technical Association of Photopolymers, Japan YR 2014 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 27 IS 2 SP 233 OP 236 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.27.233 DO https://doi.org/10.2494/photopolymer.27.233 SF ELIB - SuUB Bremen
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