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1 Ergebnisse
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Progress in Spin-on Hard Mask Materials for Advanced Lithog..:
Padmanaban, Munirathna
;
Cho, JoonYeon
;
Kudo, Takanori
...
Journal of Photopolymer Science and Technology. 27 (2014) 4 - p. 503-509 , 2014
Link:
https://doi.org/10.2494/photopolymer.27.503
RT Journal T1
Progress in Spin-on Hard Mask Materials for Advanced Lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.27.503&Exemplar=1&LAN=DE A1 Padmanaban, Munirathna A1 Cho, JoonYeon A1 Kudo, Takanori A1 Rahman, Dalil A1 Yao, Huirong A1 McKenzie, Douglas A1 Dioses, Alberto A1 Mullen, Salem A1 Wolfer, Elizabeth A1 Yamamoto, Kazuma A1 Cao, Yi A1 Her, YoungJun PB Technical Association of Photopolymers, Japan YR 2014 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 27 IS 4 SP 503 OP 509 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.27.503 DO https://doi.org/10.2494/photopolymer.27.503 SF ELIB - SuUB Bremen
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