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Novel EUV Resists Materials for 16nm HP and beyond:
Sakai, Kazunori
;
Shiratani, Motohiro
;
Fujisawa, Tomohisa
...
Journal of Photopolymer Science and Technology. 27 (2014) 5 - p. 639-644 , 2014
Link:
https://doi.org/10.2494/photopolymer.27.639
RT Journal T1 <Title>Novel EUV Resists Materials for 16nm HP and beyond</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.27.639&Exemplar=1&LAN=DE A1 Sakai, Kazunori A1 Shiratani, Motohiro A1 Fujisawa, Tomohisa A1 Inukai, Koji A1 Sakai, Kaori A1 Maruyama, Ken A1 Hoshiko, Kenji A1 Ayothi, Ramakrishnan A1 Santos, Andreia A1 Naruoka, Takehiko A1 Nagai, Tomoki PB Technical Association of Photopolymers, Japan YR 2014 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 27 IS 5 SP 639 OP 644 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.27.639 DO https://doi.org/10.2494/photopolymer.27.639 SF ELIB - SuUB Bremen
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