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1 Ergebnisse
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Development of New Photosensitive Low CTE Materials:
Doi, Takashi
;
Uno, Takaaki
;
Nishimura, Isao
.
Journal of Photopolymer Science and Technology. 28 (2015) 3 - p. 407-410 , 2015
Link:
https://doi.org/10.2494/photopolymer.28.407
RT Journal T1 <Title>Development of New Photosensitive Low CTE Materials</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.28.407&Exemplar=1&LAN=DE A1 Doi, Takashi A1 Uno, Takaaki A1 Nishimura, Isao A1 Hayashi, Eiji PB Technical Association of Photopolymers, Japan YR 2015 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 28 IS 3 SP 407 OP 410 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.28.407 DO https://doi.org/10.2494/photopolymer.28.407 SF ELIB - SuUB Bremen
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