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Improvement of Post Exposure Delay of Photo-Patternable and..:
Kubo, Hiroto
;
Doi, Takashi
;
Nishimura, Isao
...
Journal of Photopolymer Science and Technology. 28 (2015) 3 - p. 411-414 , 2015
Link:
https://doi.org/10.2494/photopolymer.28.411
RT Journal T1 <Title>Improvement of Post Exposure Delay of Photo-Patternable and Adhesive Materials for Wafer-Scale Microfluid</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.28.411&Exemplar=1&LAN=DE A1 Kubo, Hiroto A1 Doi, Takashi A1 Nishimura, Isao A1 Hayashi, Eiji A1 Hieda, Katsuhiko A1 Peters, Sara A1 Vanroosbroeck, Ruben PB Technical Association of Photopolymers, Japan YR 2015 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 28 IS 3 SP 411 OP 414 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.28.411 DO https://doi.org/10.2494/photopolymer.28.411 SF ELIB - SuUB Bremen
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