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Novel EUV Resist Development for Sub-14nm Half Pitch:
Kimoto, Takakazu
;
Naruoka, Takehiko
;
Nakagawa, Hisashi
...
Journal of Photopolymer Science and Technology. 28 (2015) 4 - p. 519-523 , 2015
Link:
https://doi.org/10.2494/photopolymer.28.519
RT Journal T1 <Title>Novel EUV Resist Development for Sub-14nm Half Pitch</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.28.519&Exemplar=1&LAN=DE A1 Kimoto, Takakazu A1 Naruoka, Takehiko A1 Nakagawa, Hisashi A1 Fujisawa, Tomohisa A1 Shiratani, Motohiro A1 Nagai, Tomoki A1 Ayothi, Ramakrishnan A1 Hishiro, Yoshi A1 Hori, Masafumi A1 Hoshiko, Kenji A1 Kimura, Toru PB Technical Association of Photopolymers, Japan YR 2015 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 28 IS 4 SP 519 OP 523 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.28.519 DO https://doi.org/10.2494/photopolymer.28.519 SF ELIB - SuUB Bremen
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