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Preface for Special Issue of Advanced Patterning Materials ..:
Nagai, Tomoki
;
Watanabe, Takeo
Journal of Photopolymer Science and Technology. 28 (2015) 6 - p. 775-775 , 2015
Link:
https://doi.org/10.2494/photopolymer.28.775
RT Journal T1 <Title>Preface for Special Issue of Advanced Patterning Materials and Processes: Opportunities in Sub-10 nm Half Pitch Patterning and Beyond</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.28.775&Exemplar=1&LAN=DE A1 Nagai, Tomoki A1 Watanabe, Takeo PB Technical Association of Photopolymers, Japan YR 2015 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 28 IS 6 SP 775 OP 775 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.28.775 DO https://doi.org/10.2494/photopolymer.28.775 SF ELIB - SuUB Bremen
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