I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Novel High Sensitivity EUV Photoresist for Sub-7 nm Node:
Nagai, Tomoki
;
Nakagawa, Hisashi
;
Naruoka, Takehiko
...
Journal of Photopolymer Science and Technology. 29 (2016) 3 - p. 475-478 , 2016
Link:
https://doi.org/10.2494/photopolymer.29.475
RT Journal T1 <Title>Novel High Sensitivity EUV Photoresist for Sub-7 nm Node</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.29.475&Exemplar=1&LAN=DE A1 Nagai, Tomoki A1 Nakagawa, Hisashi A1 Naruoka, Takehiko A1 Dei, Satoshi A1 Tagawa, Seiichi A1 Oshima, Akihiro A1 Nagahara, Seiji A1 Shiraishi, Gosuke A1 Yoshihara, Kosuke A1 Terashita, Yuichi A1 Minekawa, Yukie A1 Buitrago, Elizabeth A1 Ekinci, Yasin A1 Yildirim, Oktay A1 Meeuwissen, Marieke A1 Hoefnagels, Rik A1 Rispens, Gijsbert A1 Verspaget, Coen A1 Maas, Raymond PB Technical Association of Photopolymers, Japan YR 2016 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 29 IS 3 SP 475 OP 478 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.29.475 DO https://doi.org/10.2494/photopolymer.29.475 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
