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Fabrication of Sub-10 nm Metal Wire Circuits using Directed..:
Azuma, Tsukasa
;
Seino, Yuriko
;
Sato, Hironobu
...
Journal of Photopolymer Science and Technology. 29 (2016) 5 - p. 647-652 , 2016
Link:
https://doi.org/10.2494/photopolymer.29.647
RT Journal T1 <Title>Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.29.647&Exemplar=1&LAN=DE A1 Azuma, Tsukasa A1 Seino, Yuriko A1 Sato, Hironobu A1 Kasahara, Yusuke A1 Kobayashi, Katsutoshi A1 Kubota, Hitoshi A1 Kanai, Hideki A1 Kodera, Katsuyoshi A1 Kihara, Naoko A1 Kawamonzen, Yoshiaki A1 Minegishi, Shinya A1 Miyagi, Ken A1 Yamano, Hitoshi A1 Tobana, Toshikatsu A1 Shiraishi, Masayuki A1 Nomura, Satoshi PB Technical Association of Photopolymers, Japan YR 2016 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 29 IS 5 SP 647 OP 652 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.29.647 DO https://doi.org/10.2494/photopolymer.29.647 SF ELIB - SuUB Bremen
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