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Novel EUV Photoresist for Sub-7 nm Node:
Suzuki, Junya
;
Furukawa, Tsuyoshi
;
Miyata, Hiromu
...
Journal of Photopolymer Science and Technology. 30 (2017) 6 - p. 671-674 , 2017
Link:
https://doi.org/10.2494/photopolymer.30.671
RT Journal T1 <Title>Novel EUV Photoresist for Sub-7 nm Node</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.30.671&Exemplar=1&LAN=DE A1 Suzuki, Junya A1 Furukawa, Tsuyoshi A1 Miyata, Hiromu A1 Shiratani, Motohiro A1 Naruoka, Takehiko A1 Maruyama, Ken A1 Nakagawa, Hiroki A1 Nagai, Tomoki PB Technical Association of Photopolymers, Japan YR 2017 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 30 IS 6 SP 671 OP 674 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.30.671 DO https://doi.org/10.2494/photopolymer.30.671 SF ELIB - SuUB Bremen
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