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Multi Trigger Resist for EUV Lithography:
Popescu, Carmen
;
Vesters, Yannick
;
McClelland, Alexandra
...
Journal of Photopolymer Science and Technology. 31 (2018) 2 - p. 227-232 , 2018
Link:
https://doi.org/10.2494/photopolymer.31.227
RT Journal T1 <Title>Multi Trigger Resist for EUV Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.31.227&Exemplar=1&LAN=DE A1 Popescu, Carmen A1 Vesters, Yannick A1 McClelland, Alexandra A1 De Simone, Danilo A1 Dawson, Guy A1 Roth, John A1 Theis, Wolfgang A1 Vandenberghe, Geert A1 Robinson, Alex P.G. PB Technical Association of Photopolymers, Japan YR 2018 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 31 IS 2 SP 227 OP 232 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.31.227 DO https://doi.org/10.2494/photopolymer.31.227 SF ELIB - SuUB Bremen
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