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Novel Fast Etch Rate BARC for ArF Immersion Lithography:
Lee, Jung-June
;
Ahn, Jae-Yun
;
Jang, Min-Kyung
...
Journal of Photopolymer Science and Technology. 31 (2018) 4 - p. 541-545 , 2018
Link:
https://doi.org/10.2494/photopolymer.31.541
RT Journal T1 <Title>Novel Fast Etch Rate BARC for ArF Immersion Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.31.541&Exemplar=1&LAN=DE A1 Lee, Jung-June A1 Ahn, Jae-Yun A1 Jang, Min-Kyung A1 Shin, You Rim A1 Sim, Jae Hwan A1 Lim, Jae-Bong PB Technical Association of Photopolymers, Japan YR 2018 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 31 IS 4 SP 541 OP 545 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.31.541 DO https://doi.org/10.2494/photopolymer.31.541 SF ELIB - SuUB Bremen
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