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1 Ergebnisse
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Novel Fast Etch Rate BARC for ArF Implant Layer Lithography:
Park, Jin Hong
;
Lee, Hye-Won
;
Shin, You Rim
...
Journal of Photopolymer Science and Technology. 32 (2019) 3 - p. 435-439 , 2019
Link:
https://doi.org/10.2494/photopolymer.32.435
RT Journal T1 <Title>Novel Fast Etch Rate BARC for ArF Implant Layer Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.32.435&Exemplar=1&LAN=DE A1 Park, Jin Hong A1 Lee, Hye-Won A1 Shin, You Rim A1 Leem, Soo-Jung A1 Sim, Jae Hwan A1 Lim, Jae-Bong PB Technical Association of Photopolymers, Japan YR 2019 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 32 IS 3 SP 435 OP 439 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.32.435 DO https://doi.org/10.2494/photopolymer.32.435 SF ELIB - SuUB Bremen
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