I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Study of EB Resist Simulation for EUV Resist Evaluation:
Ohta, Yosuke
;
Sekiguchi, Atsushi
;
Voigt, Anja
.
Journal of Photopolymer Science and Technology. 33 (2020) 2 - p. 221-228 , 2020
Link:
https://doi.org/10.2494/photopolymer.33.221
RT Journal T1 <Title>Study of EB Resist Simulation for EUV Resist Evaluation</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.33.221&Exemplar=1&LAN=DE A1 Ohta, Yosuke A1 Sekiguchi, Atsushi A1 Voigt, Anja A1 Taksatorn, Nit PB Technical Association of Photopolymers, Japan YR 2020 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 33 IS 2 SP 221 OP 228 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.33.221 DO https://doi.org/10.2494/photopolymer.33.221 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
