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Proposal of hybrid deep learning systems for process and ma..:
Tsukamoto, Sou
;
Tanabe, Hidekatsu
;
Yamamura, Ryuhei
...
Journal of Photopolymer Science and Technology. 34 (2021) 2 - p. 145-148 , 2021
Link:
https://doi.org/10.2494/photopolymer.34.145
RT Journal T1 <Title>Proposal of hybrid deep learning systems for process and material design in thermal nanoimprint lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.34.145&Exemplar=1&LAN=DE A1 Tsukamoto, Sou A1 Tanabe, Hidekatsu A1 Yamamura, Ryuhei A1 Kameyama, Kai A1 Kawata, Hiroaki A1 Yasuda, Masaaki A1 Hirai, Yoshihiko PB Technical Association of Photopolymers, Japan YR 2021 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 34 IS 2 SP 145 OP 148 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.34.145 DO https://doi.org/10.2494/photopolymer.34.145 SF ELIB - SuUB Bremen
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