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Evolution of Secondary Electrons Emission During EUV Exposu..:
Fallica, Roberto
;
Nannarone, Stefano
;
Mahne, Nicola
...
Journal of Photopolymer Science and Technology. 34 (2021) 1 - p. 99-103 , 2021
Link:
https://doi.org/10.2494/photopolymer.34.99
RT Journal T1 <Title>Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.34.99&Exemplar=1&LAN=DE A1 Fallica, Roberto A1 Nannarone, Stefano A1 Mahne, Nicola A1 Malvezzi, Andrea Marco A1 Berti, Andrea A1 Simone, Danilo De PB Technical Association of Photopolymers, Japan YR 2021 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 34 IS 1 SP 99 OP 103 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.34.99 DO https://doi.org/10.2494/photopolymer.34.99 SF ELIB - SuUB Bremen
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