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Progress in EUV Photoresists for High-Resolution Patterning:
Otsubo, Yusuke
;
Sakai, Kazunori
;
Kasahara, Kazuki
...
Journal of Photopolymer Science and Technology. 35 (2022) 1 - p. 101-104 , 2022
Link:
https://doi.org/10.2494/photopolymer.35.101
RT Journal T1 <Title>Progress in EUV Photoresists for High-Resolution Patterning</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.35.101&Exemplar=1&LAN=DE A1 Otsubo, Yusuke A1 Sakai, Kazunori A1 Kasahara, Kazuki A1 Xu, Hong A1 Giannelis, Emmanuel P. A1 Ober, Christopher K. PB Technical Association of Photopolymers, Japan YR 2022 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 35 IS 1 SP 101 OP 104 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.35.101 DO https://doi.org/10.2494/photopolymer.35.101 SF ELIB - SuUB Bremen
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