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Investigation of Pressure Dependence in Photoresist Ashing ..:
Paing, Khant Nyar
;
Aizawa, Takeshi
;
Nishioka, Hiroto
...
Journal of Photopolymer Science and Technology. 35 (2022) 4 - p. 371-374 , 2022
Link:
https://doi.org/10.2494/photopolymer.35.371
RT Journal T1 <Title>Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.35.371&Exemplar=1&LAN=DE A1 Paing, Khant Nyar A1 Aizawa, Takeshi A1 Nishioka, Hiroto A1 Yamamoto, Masashi A1 Sakurai, Tasuku A1 Erdenezaya, Bat-Orgil A1 Kayamori, Yusuke A1 Nakano, Yusuke A1 Tanaka, Yasunori A1 Ishijima, Tatsuo PB Technical Association of Photopolymers, Japan YR 2022 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 35 IS 4 SP 371 OP 374 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.35.371 DO https://doi.org/10.2494/photopolymer.35.371 SF ELIB - SuUB Bremen
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