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1 Ergebnisse
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EUV Metal Oxide Resist Development Technology for Improved ..:
Dinh, Cong Que
;
Nagahara, Seiji
;
Kuwahara, Yuhei
...
Journal of Photopolymer Science and Technology. 35 (2022) 1 - p. 87-93 , 2022
Link:
https://doi.org/10.2494/photopolymer.35.87
RT Journal T1 <Title>EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.35.87&Exemplar=1&LAN=DE A1 Dinh, Cong Que A1 Nagahara, Seiji A1 Kuwahara, Yuhei A1 Dauendorffer, Arnaud A1 Yoshida, Keisuke A1 Okada, Soichiro A1 Onitsuka, Tomoya A1 Kawakami, Shinichiro A1 Shimura, Satoru A1 Muramatsu, Makoto A1 Yoshihara, Kosuke A1 Petersen, John S. A1 Simone, Danilo De A1 Foubert, Philippe A1 Vandenberghe, Geert A1 Huli, Lior A1 Grzeskowiak, Steven A1 Krawicz, Alexandra A1 Bae, Nayoung A1 Kato, Kanzo A1 Nafus, Kathleen A1 Raley, Angélique PB Technical Association of Photopolymers, Japan YR 2022 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 35 IS 1 SP 87 OP 93 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.35.87 DO https://doi.org/10.2494/photopolymer.35.87 SF ELIB - SuUB Bremen
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