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1 Ergebnisse
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Photoresist Design to Address Stochastics Issues in EUV Res..:
Kaefer, Florian
;
Yuan, Chenyun
;
Adams, Cameron
..
Journal of Photopolymer Science and Technology. 36 (2023) 1 - p. 61-66 , 2023
Link:
https://doi.org/10.2494/photopolymer.36.61
RT Journal T1 <Title>Photoresist Design to Address Stochastics Issues in EUV Resists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.36.61&Exemplar=1&LAN=DE A1 Kaefer, Florian A1 Yuan, Chenyun A1 Adams, Cameron A1 Segalman, Rachel A1 Ober, Christopher K. PB Technical Association of Photopolymers, Japan YR 2023 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 36 IS 1 SP 61 OP 66 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.36.61 DO https://doi.org/10.2494/photopolymer.36.61 SF ELIB - SuUB Bremen
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