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1 Ergebnisse
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Fundamental Evaluation of KrF Resist Changing Formulation b..:
Ohta, Yosuke
;
Sekiguchi, Atsushi
;
Yamakawa, Shinji
...
Journal of Photopolymer Science and Technology. 37 (2024) 1 - p. 89-93 , 2024
Link:
https://doi.org/10.2494/photopolymer.37.89
RT Journal T1 <Title>Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.37.89&Exemplar=1&LAN=DE A1 Ohta, Yosuke A1 Sekiguchi, Atsushi A1 Yamakawa, Shinji A1 Harada, Tetsuo A1 Watanabe, Takeo A1 Yamamoto, Hiroki PB Technical Association of Photopolymers, Japan YR 2024 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 37 IS 1 SP 89 OP 93 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.37.89 DO https://doi.org/10.2494/photopolymer.37.89 SF ELIB - SuUB Bremen
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