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A new chemical amplification resist system based on novolac..:
AHN, KWANG-DUK
;
KANG, JONG-HEE
;
KIM, SEONG-JU
...
Journal of Photopolymer Science and Technology. 5 (1992) 1 - p. 67-77 , 1992
Link:
https://doi.org/10.2494/photopolymer.5.67
RT Journal T1 <Title>A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.5.67&Exemplar=1&LAN=DE A1 AHN, KWANG-DUK A1 KANG, JONG-HEE A1 KIM, SEONG-JU A1 PARK, BYUNG-SUN A1 PARK, CHAN-EON A1 PARK, CHUN-GEUN PB Technical Association of Photopolymers, Japan YR 1992 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 5 IS 1 SP 67 OP 77 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.5.67 DO https://doi.org/10.2494/photopolymer.5.67 SF ELIB - SuUB Bremen
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