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Molecular Design of Acid Generators for EB and ArF Excimer ..:
Ushirogouchi, Tohru
;
Kihara, Naoko
;
Saito, Satoshi
...
Journal of Photopolymer Science and Technology. 7 (1994) 3 - p. 423-432 , 1994
Link:
https://doi.org/10.2494/photopolymer.7.423
RT Journal T1 <Title>Molecular Design of Acid Generators for EB and ArF Excimer Laser Exposure Using Molecular Orbital Calculations</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.7.423&Exemplar=1&LAN=DE A1 Ushirogouchi, Tohru A1 Kihara, Naoko A1 Saito, Satoshi A1 Naito, Takuya A1 Asakawa, Koji A1 Tada, Tsukasa A1 Nakase, Makoto PB Technical Association of Photopolymers, Japan YR 1994 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 7 IS 3 SP 423 OP 432 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.7.423 DO https://doi.org/10.2494/photopolymer.7.423 SF ELIB - SuUB Bremen
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