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Progress in acetal based deep UV resist:
Padmanaban, Munirathna
;
Kinoshita, Yoshiaki
;
Kudo, Takanori
...
Journal of Photopolymer Science and Technology. 7 (1994) 3 - p. 461-472 , 1994
Link:
https://doi.org/10.2494/photopolymer.7.461
RT Journal T1 <Title>Progress in acetal based deep UV resist</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.7.461&Exemplar=1&LAN=DE A1 Padmanaban, Munirathna A1 Kinoshita, Yoshiaki A1 Kudo, Takanori A1 Lynch, Thomas A1 Masuda, Seiya A1 Nozaki, Yuko A1 Okazaki, Hiroshi A1 Pawlowski, Georg A1 Przybilla, Klaus J. A1 Roeschert, Horst A1 Spiess, Walter A1 Suehiro, Natsumi PB Technical Association of Photopolymers, Japan YR 1994 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 7 IS 3 SP 461 OP 472 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.7.461 DO https://doi.org/10.2494/photopolymer.7.461 SF ELIB - SuUB Bremen
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